濺射靶材：57mm Ø x 0.3mm Chromium(標(biāo)準(zhǔn)配置：鉻靶材一個(gè))
產(chǎn)品選購
貨號
產(chǎn)品名稱
規(guī)格
3380
EMS150T S - High resolution turbomolecular pumped sputter coater, including a 54mm Ø x 0.3mm chromium target
標(biāo)準(zhǔn)配置
91003
Edwards RV3 50L/s two-stage rotary pump, with vacuum hose, coupling kit and oil mist filter
個(gè)
其它附件的選購:
貨號
產(chǎn)品名稱
規(guī)格
3200
Sputtering head insert suitable for oxidizing and non-oxidizing metals. Supplied with a 54mm x 0.3mm thick chromium target as standard. For additional targets see Sputtering Targets section
個(gè)
3210
Additional sputter insert for quick metal change. Note: this is an entire sputtering assembly.
個(gè)
3270
Extended height vacuum chamber (214mm high – the standard chamber is 127mm high). For increased source to sample distance and for coating large specimens
個(gè)
3280
Vacuum spigot allows more convenient connection of the vacuum hose to the rear of the EMS150T when bench depth is limited
個(gè)
3290
Film thickness monitor (FTM) attachment. Consists of a built in chamber mounted quartz crystal oscillator (includes crystal). As sputtered or evaporated material is deposited onto the crystal, so its frequency of oscillation is modified. This ‘modification’ is used to measure and control the thickness of material deposited
個(gè)
3300
Spare quartz crystals. Pack of three
個(gè)
3320
Full range vacuum gauge for low and high vacuum measurement (a low vacuum Pirani gauge is fitted as standard)
個(gè)
4513
Glow discharge insert to modify surface properties (eg hydrophobic to hydrophilic conversion) or to clean surface residues (TS and T ES only). Can be retrofitted
個(gè)
3340
Rotate-tilt specimen stage with adjustable tilt (up to 90 degrees) and height (37mm-60mm). Tilt angle can be pre-set. 50mm Ø specimen platform with six stub positions for 15mm or 6.5mm or 1/8" pin stubs. Stage rotation speed variable between 8 and 20rpm
個(gè)
3350
Variable angle “Rotacota” rotary planetary stage with 50mm Ø specimen platform. Has six stub positions for 15mm or 6.5mm or 1/8" pin stubs. Stage rotation speed variable between 8 and 20rpm
個(gè)
3360
Flat rotation specimen stage for 100mm / 4” wafers, includes gearbox for increased coverage. Stage rotation speed variable between 8 and 20rpm
個(gè)
3370
variable between 8 and 20rpm. Includes gear box to allow optional FTM to be used
免責(zé)聲明：以上所展示的[ EMS 150T鍍膜儀(鍍碳儀、噴金儀、離子濺射鍍膜儀)]信息由會(huì)員[海德創(chuàng)業(yè)(北京)生物科技有限公司]自行提供，內(nèi)容的真實(shí)性、準(zhǔn)確性和合法性由發(fā)布會(huì)員負(fù)責(zé)。
